SCE:短通道效应
“短通道效应”(Short Channel Effect,简称SCE)是电子工程与半导体物理领域的重要概念,常缩写为SCE以便于学术交流和文献书写。这一术语描述了当MOSFET等器件的沟道长度缩短到一定程度时,由电场增强引起的器件性能变化现象,对集成电路微型化设计具有关键影响。
Short Channel Effect具体释义
Short Channel Effect的英文发音
例句
- The model includes the substrate bias effect, the short channel effect and the relation between these two effects.
- 它综合考虑了衬偏效应、短沟道效应以及两者之间的关系。
- It was also shown that the novel device could suppress the short channel effect, drain-induced barrier lowering effect.
- 同时用实验结果表明,新结构器件能够有效抑制短沟道效应(SCE)、减小漏感应势垒降低效应(DIBL)等。
- An analytical subthreshold surface potential model for the DMG SOI MOSFET with high k gate dielectrics, which accounts for the short channel effect and the fringing field effect, has been developed.
- 还研究了高k栅介质对DMGSOIMOSFET的影响,为高k栅介质DMGSOIMOSFET建立了表面势模型,模型中考虑了边缘电场效应和短沟道效应。
- Schottky source and drain junctions are a promising structure to minimize the MOSFET short channel effect.
- 采用Schottky结源漏结构是克服传统MOSFET器件短沟效应的一种有效方法。
- The research results indicate that with the increase of the concave corner, the negative junction depth and the doping density of channel, the hot carrier effect immunity is enhanced; the threshold voltage increases and the short channel effect is suppressed.
- 研究发现,随着凹槽拐角、负结深的增大和沟道杂质浓度的提高,器件的抗热载流子能力增强,阈值电压升高,对短沟道效应的抑制作用增强。
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