S/D:源极/漏极

在电子学与半导体器件等专业学术领域,人们常将“Source/Drain”简写为“S/D”,以提升书面和口头表达的效率。该术语对应的中文名称为“源极/漏极”,主要用于描述场效应晶体管(FET)等电子元件中的关键电极结构。

Source/Drain具体释义

  • 英文缩写:S/D
  • 英语全称:Source/Drain
  • 中文意思:源极/漏极
  • 中文拼音:yuán jí lòu jí
  • 相关领域sd 电子

Source/Drain的英文发音

例句

  1. Based on the charge control theory, an accurate analytical model for the dc I V characteristics and small signal parameters of an AlGaN / GaN high electron mobility transistor ( HEMT ) is developed considering the effects of polarization and parasitic source drain resistances.
  2. 基于电荷控制理论,考虑到极化效应和寄生漏源电阻的影响,建立了能精确模拟AlGaN/GaN高电子迁移率晶体管直流IV特性和小信号参数的解析模型。
  3. A new structure of gate_modulated lightly doped drain of TFT was proposed. It is very effective to lower gate_induced drain_leakage current of the TFTs when a higher source drain voltage is applied to it.
  4. 在进一步的研究中,设计了一种新型的栅控轻掺杂漏区(GMLDD)结构,有效地解决了在较高源漏电压下的栅诱导漏电问题。
  5. And the relationship between the source drain current and the split-gate voltage; and how to find the cut off voltage of the quasi-1D electron channel;
  6. 研究准一维电子通道中不同源漏电流与分裂门负偏压的关系,以找到分裂门的钳断点电压;
  7. From the quoted equation for the current between source and drain Ids of the sub-threshold MOSFET, the expression for the voltage between gate and source drain Vgs of the sub-threshold MOSFET is directly got and the temperature characteristic of Vgs is theoretically analyzed.
  8. 直接从亚阈值MOSFET漏源电流(即亚阈值电流)的方程中,得到亚阈值MOSFET栅源电压表达式,并分析其温度特性。
  9. Source drain Ohmic contacts and Schottky metal system is Ti / Al / Pt / Au and Pt / Au, respectively.
  10. 漏源欧姆接触采用Ti/Al/Pt/Au,肖特基结金属为Pt/Au。