S/D:源极/漏极
在电子学与半导体器件等专业学术领域,人们常将“Source/Drain”简写为“S/D”,以提升书面和口头表达的效率。该术语对应的中文名称为“源极/漏极”,主要用于描述场效应晶体管(FET)等电子元件中的关键电极结构。
Source/Drain的英文发音
例句
- Based on the charge control theory, an accurate analytical model for the dc I V characteristics and small signal parameters of an AlGaN / GaN high electron mobility transistor ( HEMT ) is developed considering the effects of polarization and parasitic source drain resistances.
- 基于电荷控制理论,考虑到极化效应和寄生漏源电阻的影响,建立了能精确模拟AlGaN/GaN高电子迁移率晶体管直流IV特性和小信号参数的解析模型。
- A new structure of gate_modulated lightly doped drain of TFT was proposed. It is very effective to lower gate_induced drain_leakage current of the TFTs when a higher source drain voltage is applied to it.
- 在进一步的研究中,设计了一种新型的栅控轻掺杂漏区(GMLDD)结构,有效地解决了在较高源漏电压下的栅诱导漏电问题。
- And the relationship between the source drain current and the split-gate voltage; and how to find the cut off voltage of the quasi-1D electron channel;
- 研究准一维电子通道中不同源漏电流与分裂门负偏压的关系,以找到分裂门的钳断点电压;
- From the quoted equation for the current between source and drain Ids of the sub-threshold MOSFET, the expression for the voltage between gate and source drain Vgs of the sub-threshold MOSFET is directly got and the temperature characteristic of Vgs is theoretically analyzed.
- 直接从亚阈值MOSFET漏源电流(即亚阈值电流)的方程中,得到亚阈值MOSFET栅源电压表达式,并分析其温度特性。
- Source drain Ohmic contacts and Schottky metal system is Ti / Al / Pt / Au and Pt / Au, respectively.
- 漏源欧姆接触采用Ti/Al/Pt/Au,肖特基结金属为Pt/Au。
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