NIL：纳米压印光刻

纳米压印光刻（Nano-Imprint Lithography，简称NIL）是一种先进微纳加工技术，通过机械压印方式在纳米尺度实现图形转移。该技术因操作简便、成本较低且分辨率高，在医学物理、生物芯片制造、医疗器械开发等领域应用广泛。采用缩写“NIL”便于学术交流与文献书写，有效提升专业场景下的沟通效率。

Nano-Imprint Lithography具体释义

  • 英文缩写：NIL
  • 英语全称：Nano-Imprint Lithography
  • 中文意思：纳米压印光刻
  • 中文拼音：nà mǐ yā yìn guāng kè
  • 相关领域： nil 医学物理学

Nano-Imprint Lithography的英文发音

例句

  1. Based on the nano-imprint lithography ( NIL ) combining with layered manufacture principle, a novel three-dimensional micro-electronic mechanical system ( MEMS ) fabrication process is investigated.
  2. 针对目前微电子机械系统（MEMS）制造中存在的三维加工能力不足的问题，将压印光刻技术和分层制造原理相结合，研究了三维MEMS制造的新工艺。
  3. Nano-imprint stamp is the most important tool of nano-imprint lithography techniques, the traditional materials are silicon and quartz, but they are brittle and expensive. The researchers are studying a more suitable material as nano-imprint stamp.
  4. 纳米压印模板是纳米压印技术最重要的工具，由于传统硅、石英材料的脆性和加工昂贵，研究人员正在研究更适合于纳米压印技术的模板材料。
  5. With the continuous development of MEMS / NEMS technology, nano-imprint lithography has become one of the focused micro-nano graphics replication process in recent years, and it is considered to be one of the most potential nano lithography technique to replicate large area nanostructures with high-resolution.
  6. 随着MEMS/NEMS工艺的不断发展，这一技术成为了近年来微纳图形复制工艺的研究热点之一，被誉为最具有发展潜力的制作纳米结构的技术之一。
  7. The novel methods include nano-imprint, laser interference lithography, x-ray lithography, electron beam lithography, focused ion beam and so on.
  8. 包括纳米压印、激光干涉光刻、x射线光刻、电子束光刻、聚焦离子束刻蚀等。

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