NBE:近带边

“近带边”(Near Band Edge)在电子学及相关学术领域中是一个常见术语,常被缩写为NBE,以便于快速书写和日常使用。这一缩写广泛应用于半导体物理、材料科学等研究方向,主要用于描述电子能带结构中靠近能带边缘的重要物理特性。

Near Band Edge具体释义

  • 英文缩写:NBE
  • 英语全称:Near Band Edge
  • 中文意思:近带边
  • 中文拼音:jìn dài biān
  • 相关领域nbe 电子

Near Band Edge的英文发音

例句

  1. The room-temperature photoluminescence spectrum of the ZnO ∶ F film showed a strong near band edge ultraviolet emission located at 379 nm with a narrow linewidth of 73 meV and a very weak visible emission associated with deep level defects.
  2. 对ZnO∶F薄膜的室温光致发光谱可以观察到位于379nm、半峰全宽为73meV的紫外发射峰,而相应于缺陷的深能级发射则完全猝灭。
  3. Gate Charge Relaxation Mechanism of MOS Structure with Zero Biased Source and Transient Spectroscopic Measurement of Si / SiO_2 Interface State Distribution near Minority Carrier Band Edge
  4. 零偏源MOS结构的栅电荷弛豫机制及近少子带边界面态分布的瞬态谱测定