GD:闸门排水
在电子工程与半导体器件等学术与科技领域中,“Gate to Drain”是一个描述场效应晶体管(FET)关键结构关系的专业术语,通常缩写为“GD”。该缩写广泛用于简化书面记录和口头交流中,便于快速表达和参考。其对应的中文含义为“闸极至漏极”,有时也简称为“闸漏”,用于描述栅极和漏极之间的电气连接或电容效应。
Gate to Drain的英文发音
例句
- The saturation drain current at each gate bias decreased while the gate to drain breakdown voltage increased remarkably with the ( NH 4 ) 2S x treatment.
- 处理后,器件各栅偏压下的源漏饱和电流降低了,栅漏击穿电压有了显著提高。
- The asymmetry isolation layer between the source / drain electrodes and the gate used in the experiment results in asymmetric mod-ulation of gate electrostatic field to source electrode and drain electrode. Therefore solo gate electrostatic field modulation to the drain electrode is realized.
- 实验中采用了源/漏电极不对称的绝缘层结构,使得门电压对源漏两极的电场调制也不对称,从而实现了对漏电极的门电压调制。
- It may be concluded that DC transfer characteristics of high temperature CMOS inverter and gate circuits deteriorate due to reductions in carrier mobility and threshold voltages of MOSFETs and increase of leakage current of MOSFET's drain terminal pn junc-tion at high temperature.
- 根据分析,高温MOSFET阈值电压和载流子迁移率的降低,以及MOSFET漏端pn结泄漏电流的增加引起了CMOS倒相器和门电路直流传输特性劣化。
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